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    纳米光子学研究院创建于2016年,2023年获批广东省纳米光学操控重点实验室。研究院和省重点实验室是具有重要影响力的高水平科研单位,也是暨南大学光学与光学工程学科重地和高层次人才聚集地。
    
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    The institute is led by Professor Baojun Li, the Distinguished Cheung Kong Scholar Professor ...
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    The institute focuses on the following four cutting-edge, fundamental & innovative fields of research ...
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首页  学术报告
新加坡国立大学 Soo-Jin Chua 教授学术报告

发布时间:2022-09-16

报告题目:Plasmonic interconnects for global wires in Integrated Circuits beyond the 10 nm nodes

报告人:Soo-Jin Chua  教授

主持人:辛洪宝  教授

时间:2022年9月22日10:00~11:00

形式:线上报告,腾讯会议:396-976-313

 

报告摘要:The relentless drive towards higher chip performance has always been to develop smaller dimension devices and broader bandwidth interconnects. In the 10 nm technology, it is seen that the global wires (top metals) with pitch of ~ 11 μm for asynchronous communication occupy a large footprint both in the vertical and lateral directions. To further scale down the dimension, surface plasmon polariton (SPP), working at optical frequencies, is shown to have the potential to play a unique and important role in enhancing the processing speed at reduced dimensions of future integrated circuits. In this seminar, a broad perspective is given of the historical development of the integrated circuit and highlight the key issue of the dense network of metallization to interconnect the transistors. Experimental verification is presented using a scattering-type Scanning Near-field Optical Microscopy (s-SNOM) of SPP propagation in an air/Au/Si waveguide. A CMOS-compatible dielectric-metal-dielectric (I-M-I) plasmonic waveguide, with a 40 nm thick metal or metal-like strip such as Cu or TiN on silicon substrate is proposed for intra-chip communication. The propagation characteristics of the I-M-I waveguide were investigated by numerical simulation.

 

报告人简介:Dr Soo-Jin Chua is Professor Emeritus of Electrical Engineering at the National University of Singapore (NUS), and served at Deputy Executive Director of IMRE from 2004 to 2010 and Deputy Director of the Singapore-MIT Alliance from 1999 to 2014 and Director, Centre for Optoelectronics (1980 – 2010). His research area is in III-Nitrides grown by MOCVD, ZnO by hydrothermal synthesis, and fabrication of optoelectronic devices such as semiconductor lasers and optical waveguide components and applications of nanostructures and plasmonics in Optoelectronics. He has published more than 500 journal papers, authored or co-authored 30 patents and graduated 45 PhD and another 50 MEng students. His h-index is 48 and has over 9000 citations. He was a Principal Investigator in SMART (Singapore-MIT Alliance for Research and Teaching) and Co-Investigator of a National Research Foundation (NRF) funded project in NUS on Plasmonics. His expertise in Semiconductor Optoelectronics developed for the past 30 years has given him fresh and novel insights into the field which he developed into courses he lectured at The University Chinese Academy of Science, Beijing, Xi’an Jiao Tong University and Northwest Polytechnical University, Xi’an over the last six years. He is confirmed as a High-Level Talent (Category A) by the Jiangsu Provincial Administration of Foreign Expert Affairs and holds a Foreign Talent R Visa from China。

 

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